光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)涉及水(shui)分解制氫制氧、二氧化(hua)(hua)(hua)碳還(huan)原、廣泛的(de)有(you)機(ji)(ji)反(fan)(fan)應(ying)及光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)檢測(ce)等(deng)方(fang)面。光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)池(chi)(chi)(chi)是光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)中一個(ge)(ge)格(ge)外重要的(de)裝置(zhi)(zhi):作為光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)的(de)載(zai)體，光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)池(chi)(chi)(chi)用來容納反(fan)(fan)應(ying)體系、裝載(zai)電(dian)(dian)(dian)極、供應(ying)光(guang)(guang)照窗(chuang)口。當前，正在用法(fa)的(de)光(guang)(guang)電(dian)(dian)(dian)化(hua)(hua)(hua)學(xue)(xue)(xue)反(fan)(fan)應(ying)池(chi)(chi)(chi)大(da)多(duo)用法(fa)方(fang)形池(chi)(chi)(chi)體，方(fang)形池(chi)(chi)(chi)體由有(you)機(ji)(ji)膠(jiao)粘(zhan)合(he)而(er)成(cheng)，當溶(rong)(rong)液(ye)中含有(you)有(you)機(ji)(ji)溶(rong)(rong)劑或(huo)強腐(fu)蝕性物質會對有(you)機(ji)(ji)膠(jiao)造成(cheng)損(sun)害，長時(shi)間用法(fa)會使整(zheng)個(ge)(ge)池(chi)(chi)(chi)體散開，用法(fa)不便(bian):另外全部電(dian)(dian)(dian)極都被(bei)置(zhi)(zhi)干(gan)反(fan)(fan)應(ying)池(chi)(chi)(chi)內部使得反(fan)(fan)應(ying)池(chi)(chi)(chi)的(de)體積都格(ge)外大(da)，也不利于(yu)電(dian)(dian)(dian)極與反(fan)(fan)應(ying)液(ye)接觸。

高壓(ya)觀察反(fan)應(ying)(ying)(ying)池/光(guang)電化學反(fan)應(ying)(ying)(ying)的裝置，頂照式高壓(ya)反(fan)應(ying)(ying)(ying)池，底照式高壓(ya)反(fan)應(ying)(ying)(ying)池，平行高壓(ya)反(fan)應(ying)(ying)(ying)器，光(guang)催化反(fan)應(ying)(ying)(ying)釜(fu)，小(xiao)型高壓(ya)反(fan)應(ying)(ying)(ying)器，光(guang)照化學反(fan)應(ying)(ying)(ying)釜(fu)